22nm Technology Yield Optimization Using Multivariate 3D Virtual Fabrication
September 9, 20133D NAND Flash Processing
March 10, 2015You must have an account on our Customer Portal to access this content. If you already have an account, please log in using the form below or to the right. If you do not have an account, we invite you to request an account.
Whitepaper:Evaluating MEMS Devices Virtual Metrology & DRIE
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This paper explores the capabilities of Coventor’s powerful SEMulator3D semiconductor process modeling platform. In this detailed report, MEMS device virtual metrology and virtual fabrication of DRIE based structures is demonstrated. An RF Tunable capacitor, similar to a gyroscope with rotative displacement using comb-drive electrostatic actuation, is used to demonstrate virtual fabrication. Virtual metrology measurements are also extracted for the device. The tunable capacitor modeling exercise illustrates the platform’s capabilities, both in predictive design technology modeling and in virtual measurement data extraction.
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Impact of EUV Resist Thickness on Local Critical Dimension Uniformities for <30 nm CD Via Patterning
Impact of EUV Resist Thickness on Local Critical Dimension Uniformities for <30 nm CD Via Patterning
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