• Self-aligned Fin Cut Last Patterning Scheme for Fin Arrays of 24nm Pitch and Beyond

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  Self-aligned Fin Cut Last Patterning Scheme for Fin Arrays of 24nm Pitch and Beyond

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• N7 FinFET Self-Aligned Quadruple Patterning Modeling

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  N7 FinFET Self-Aligned Quadruple Patterning Modeling

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• Understanding the Effect of Variability in Bulk FinFET Device Performance

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  Understanding the Effect of Variability in Bulk FinFET Device Performance

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• Understanding how small variations in photoresist shape significantly impact multi-patterning yield

  Read more - Understanding how small variations in photoresist shape significantly impact multi-patterning yield

  

  Understanding how small variations in photoresist shape significantly impact multi-patterning yield

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• Self-aligned quadruple patterning to meet requirements for fins with high density

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  Self-aligned quadruple patterning to meet requirements for fins with high density

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• Modeling of Cross Wafer Induced Process Variations

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  Modeling of Cross Wafer Induced Process Variations

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• FinFET Front End of Line FEOL Process Integration

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  FinFET Front End of Line FEOL Process Integration

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